Fabrication Techniques
Most people are aware of the revolution in semiconductor manufacturing, where devices are processed on an automated production line. The lithographical tools used in the device physics group are analogous to these systems, operated on a smaller scale so that novel samples can be produced in batches.
In our group a range of techniques are used for device production. Deposition of thin films followed by photolithography are the main steps in producing intermediate scale devices to which contacts can be made. Further device processing is then done by Argon Ion beam milling or by Focussed Ion beam milling. Currently the group is looking into adding electron beam lithography to our range of process techniques, as more and more sub-micron superconducting devices are designed. The group also has an extensive range of imaging techniques including a state of the art AFM / STM system. For more information about the group's facilities, please see the Facilities page.